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Multi Arc Sputter Coating Machine / Thin Film Deposition Equipment For Ashtray

Categories Sputter Coating Machine
Brand Name: ATOP
Model Number: ATZK
Certification: ISO9001
Place of Origin: Jiangsu, China (Mainland)
MOQ: 1 set
Price: By negotiation
Payment Terms: L/C, T/T
Supply Ability: 200 sets/year
Delivery Time: 60working days
Packaging Details: In film
Customization: Yes
Condition: New
Chamber Material: SUS304
After sale service: Engineers avaliable to service machinery oversea
Technology: Magnetron Sputtering
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    Multi Arc Sputter Coating Machine / Thin Film Deposition Equipment For Ashtray

    ATOP Ashtray Multi Arc Magnetron Sputtering Vacuum Coating Machine


    Equipment Configuration


    Structure type:Vertical type or horizontal type

    Chamber type:single door or double doors

    Application Field



    It applies to hardware,glass crafts,ceramic crafts,such us watches,mobile phone metal shell,sanitary

    ware,mould,electronic products,crystal glass, glasses, cutlery, knives and so on.

    You can make super-hard wear-resistant film coating, anti-corrosion film, decorative film(gold color,rose

    gold,coffee,brown,bronze,blue,black,white,gray and other colors),it combined with magnetron sputtering

    technique can be plated the multilayer composite membrane and manufactured plated stainless steel,

    aluminum, titanium, tungsten and other metal films may be manufactured as coated TIN, TIC, TICN, TIALN,

    CRN, CU, AU, diamond film (DLC), decorative film metal, film and non-metallic composite coating film and

    its compounds film.


    Main Feature

    1. Magnetron sputtering principle is based on the theory of the cathode glow discharge, it expend the
    cathode surface magnetic field near the work piece surface. Then it improves the sputtered atom
    ionization rate. It keeps the magnetron sputtering uniformity, also can improve the surface shining effect.

    2. The arc plasma evaporation source is reliable, it can work under 40A current in optimizing the cathode
    and the magnetic field structure,. It will happen atomic diffusion between the coating and the material. It
    also has the advantages that lon Beam Assisted Deposition.

    3. Vacuum pumping system, electric control system and complete vacuum coating system can be
    customized according to user requirements.


    4. It equipments cryogenic ion secondary source, some substrate without heating the material, It can

    directly do the cold plating film at room temperature, save energy, increase productivity.


    5. The maximum of the temperature for tool coating chamber can 600 degrees, In addition to the tool

    Coater coating applications require heating device, other applications do not need the device.



    Product Name


    ATOP Ashtray Multi Arc Magnetron Sputtering Vacuum Coating Machine


    Vacuum Chamber Size

    Decide according to the substrate size and output

    Substrate


    Hardware,glass crafts,ceramic crafts,such us watches,mobile phone metal

    shell,sanitary ware,mould,electronic products,crystal glass, glasses, cutlery,

    knives and so on


    Coating Film

    High-grade decorative coating.

    Coating Color


    Gold,rose gold,coffee,brown,bronze,blue,black,white,gray etc.


    Applications


    Hardware,glass crafts,ceramic crafts .

    Structure


    Vertical type ; horizontal type ; single door type ; double-door type.

    Coating Material


    Stainless steel, aluminum, titanium, tungsten and other metal films may
    be manufactured as coated TIN, TIC, TICN, TIALN, CRN, CU, AU, diamond film

    (DLC), decorative film metal, film and non-metallic composite coating film and its

    compounds film.

    Features


    High pumping speed, high efficiency, energy saving, full automatic process

    controller can be simple, reliable, beautiful.


    Working principle



    Magnetron sputtering working principle of vacuum coating machine, the so-called "splash", under the

    action of the electrons in an electric field accelerates to the substrate in the process of collision with argon

    atoms, ionization out large amounts of argon ions and electrons.The electron flies toward the substrate,

    the argon ion speeds up the target material under the action of the electric field, sputtering out a large

    number of target atom, and the neutral target atom (or molecule) is deposited on the substrate to form the

    film.Secondary electron in accelerating to fly to the substrate by magnetic field in the process of lorentz

    magnetic force, the influence of confined area near the target surface plasma, the plasma density in the

    area is very high, secondary electron under the action of magnetic field around the target surface is

    circular motion, the electron motion path is very long, constantly in the process of movement of the impact

    ionization out large amounts of argon ion bombardment of target, after many times of collision of the

    electron energy gradually reduce, cast off the yoke of the magnetic field lines, away from the target

    material, the final deposition on the substrate.


    Coating Samples













































































































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